JPH0323303Y2 - - Google Patents
Info
- Publication number
- JPH0323303Y2 JPH0323303Y2 JP11587985U JP11587985U JPH0323303Y2 JP H0323303 Y2 JPH0323303 Y2 JP H0323303Y2 JP 11587985 U JP11587985 U JP 11587985U JP 11587985 U JP11587985 U JP 11587985U JP H0323303 Y2 JPH0323303 Y2 JP H0323303Y2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- microwave
- plasma generation
- plasma processing
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 description 17
- 230000032258 transport Effects 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012495 reaction gas Substances 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000001012 protector Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11587985U JPH0323303Y2 (en]) | 1985-07-30 | 1985-07-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11587985U JPH0323303Y2 (en]) | 1985-07-30 | 1985-07-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6224940U JPS6224940U (en]) | 1987-02-16 |
JPH0323303Y2 true JPH0323303Y2 (en]) | 1991-05-21 |
Family
ID=30999947
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11587985U Expired JPH0323303Y2 (en]) | 1985-07-30 | 1985-07-30 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0323303Y2 (en]) |
-
1985
- 1985-07-30 JP JP11587985U patent/JPH0323303Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS6224940U (en]) | 1987-02-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW376547B (en) | Method and apparatus for plasma processing | |
TW347549B (en) | Plasma processor for large workpieces | |
JPH0323303Y2 (en]) | ||
JP3870598B2 (ja) | プラスチック容器の成膜装置 | |
JPH0441172Y2 (en]) | ||
JP2000058508A5 (en]) | ||
JPH02267290A (ja) | マイクロ波プラズマ処理装置 | |
JPS6236240Y2 (en]) | ||
CN218103615U (zh) | 一种等离子体治疗装置 | |
CN112911781A (zh) | 阵列式矩形腔微波等离子发生器 | |
JPH0425222Y2 (en]) | ||
JP2967681B2 (ja) | マイクロ波プラズマ処理装置 | |
JPS6222652B2 (en]) | ||
JPH02149339A (ja) | マイクロ波プラズマ処理装置 | |
JPS6116502B2 (en]) | ||
JPS5644763A (en) | Cvd device under reduced pressure | |
JPH0572092U (ja) | 高圧容器への電磁波供給装置 | |
JP2004031509A (ja) | マイクロ波を用いた大気圧プラズマ処理方法及び装置 | |
JPS63235480A (ja) | マイクロ波プラズマcvd装置 | |
JPH07283203A (ja) | 表面処理装置 | |
JPS6224941U (en]) | ||
JPH01155639U (en]) | ||
JPS634997Y2 (en]) | ||
JPH01319930A (ja) | 気相成長装置 | |
JPS6195435U (en]) |